In this study, we created a hydroxyapatite (HAp) coating layer on top of the Ti-6Al-4V substrate via sequent H2O2-
oxidizing and RF-sputtering processes and determining the effect of H2O2-oxidizing state to the adhesion between HAp
coating layer and Ti-6Al-4V substrate. The results showed that the H2O2-oxidized Ti-6Al-4V surface is rough and
porous, which increases the adhesion strength of the HAp coating layer on the alloy substrate. The shear strength value
of the HAp/H2O2-oxidized Ti-6Al-4V substrate was 69.3 MPa, significantly higher than that of the HAp/original Ti-
6Al-4V substrate (12.9 MPa). The X-ray photoelectron spectroscopy (XPS) proved the denser HAp coating layer
covered the TiO2/Ti-6Al-4V substrate, consequently effectively prevented releasing of the unwanted toxic elements
from the metallic implant.
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Cite this paper: Vietnam J. Chem., 2020, 58(5), 654-660 Article
DOI: 10.1002/vjch.202000064
654 Wiley Online Library © 2020 Vietnam Academy of Science and Technology, Hanoi & Wiley-VCH GmbH
Characteristics of hydroxyapatite coating on Ti-6Al-4V substrate
fabricated via sequent H2O2-oxidizing and RF-sputtering processes
Nguyen Thi Truc Linh1*, Phan Dinh Tuan2
1Department of Chemistry, Ho Chi Minh City University of Education,
280 An Duong Vuong, ward 4, district 5, Ho Chi Minh City 70000, Viet Nam
2Ho Chi Minh City University of Natural Resources and Environment,
236B Le Van Sy, ward 1, Tan Binh district, Ho Chi Minh City 70000, Viet Nam
Received April 28, 2020; Accepted August 18, 2020
Abstract
In this study, we created a hydroxyapatite (HAp) coating layer on top of the Ti-6Al-4V substrate via sequent H2O2-
oxidizing and RF-sputtering processes and determining the effect of H2O2-oxidizing state to the adhesion between HAp
coating layer and Ti-6Al-4V substrate. The results showed that the H2O2-oxidized Ti-6Al-4V surface is rough and
porous, which increases the adhesion strength of the HAp coating layer on the alloy substrate. The shear strength value
of the HAp/H2O2-oxidized Ti-6Al-4V substrate was 69.3 MPa, significantly higher than that of the HAp/original Ti-
6Al-4V substrate (12.9 MPa). The X-ray photoelectron spectroscopy (XPS) proved the denser HAp coating layer
covered the TiO2/Ti-6Al-4V substrate, consequently effectively prevented releasing of the unwanted toxic elements
from the metallic implant.
Keywords. Hydroxyapatite, Ti-6Al-4-V, implant, biomaterials.
1. INTRODUCTION
Titanium (Ti) alloys, including binary and tertiary
compounds, have been applied in a lot of industrial
fields, especially in biomedical (prostheses,
implants) applications for many years owing to
corrosion resistance[1], sliding wear resistance,
superior tensile and fracture toughness.[2-4] The
challenging issues include enhancing compatibility
between biomedical materials and human bodies and
ensuring sustainable clinical performance. Implanted
Ti alloys in an organization may release unwanted
toxic ions, which makes the surrounding tissue
damaged. Consequently, human bodies may reject
the implanted materials out.[5,6] Researchers
modified the surface of Ti-alloys by coating with a
non-toxic and bio-active ceramic such as
hydroxyapatite (HAp, Ca10(PO4)6(OH)2).[7] The
adhesion between HAp and Ti alloy is worthly
considering because it directly affects the stability of
the implanted material in bodies for the long-term
applications.[8] Both coating and substrate
characteristics determine the adhesion strength that
relates to interacting forces such as chemical
interaction or Van der Waals physical interaction, as
well as mechanical anchorage. The bonding strength
of the coating to a substrate could be significantly
improved due to factors as follows: a denser
microstructure and highly crystalline HAp coating
layer, a rough and porous Ti–6Al–4V substrate. The
methods measure the bonding strength of HAp
coating layer to the Ti–6Al–4V substrate such as the
indentation[9], the standard tensile adhesion test,[10]
the standard adhesion test ISO 13779-4,[11] the
standard adhesion test ASTM F1044-99,[12] the
interfacial indentation test[13]. In other publications,
pre-treating processes of Ti–6Al–4V substrate to
form interfacial layers (TiO2 or TiN) improve the
adhesion strength because the inner layers increase
mechanical integrity[14] or reduce the decomposition
of HAp.[12] The bonding strength between HAp
coating layer and Ti–6Al–4V implant enhances
thanks to the formation of a porous surface of Ti
alloys. Our primary research investigated that the
surface of Ti-6Al-4V oxidized in the H2O2 solution
became a sponge-like nanostructured surface. Its
feathers are considered as an advantage factor to
form a denser microstructure of the HAp layer at the
second state. Thus, the present study aims: (1) to
create a HAp coating layer on top of the Ti-6Al-4V
substrate via sequent H2O2-oxidizing and RF-
sputtering processes; (2) to determine the effect of
H2O2-oxidizing state to the adhesion between HAp
coating layer and Ti-6Al-4V substrate.
Vietnam Journal of Chemistry Nguyen Thi Truc Linh, Phan Dinh Tuan
© 2020 Vietnam Academy of Science and Technology, Hanoi & Wiley-VCH GmbH www.vjc.wiley-vch.de 655
2. MATERIALS AND METHODS
2.1. Preparation of Ti alloy samples
Commercially procured Ti-6Al-4V alloy (Gr 5,
ASTM, BAOJI TI-LEADER METAL
PROCESSING CO.), with a diameter of 10 mm and
a thickness of 1 mm, was used as matrix alloy
material and substrate. The Ti-6Al-4V alloy
substrates were sandblasted with SiC abrasive
papers (120-2500 μm) and polished with the Struers-
DAP-U system, Denmark, then oxidized in an H2O2
solution. The operation frequency of RF magnetron
sputtering device (Angstrom Sciences, USA) was
13.56 MHz and a power of 150 W, with the base
pressure of 1.33×10−5 Pa and the working pressure
of 7.32×10−5 Pa.[23] HAp target (Ca10(PO4)6(OH)2,
High Purity Chemicals Lab. Corp., Grade: 99.99 %)
was employed as the source material. Before
sputtering, the chamber was held at the pre-
sputtering regime for 10 min (shutter closed) to
remove any contaminations on the target surface and
also to stabilize the deposition parameters. The
oxidized Ti-6Al-4V substrates were fixed onto the
substrate holder, which was inverted to face down
and centrally positioned in parallel just above the
source material with a target-to-substrate distance of
40 mm. The deposition time was varied from 0.5 to
2 hours to adjust the thickness of resulting films.
The synthesized alloy coatings (i.e., HAp/H2O2-
oxidized alloy) were then annealed in a vacuum
furnace (ACE Vac) at a pressure of 3340 Pa and a
temperature of 400 C, reached with a ramp rate of
10 °C/min, for 2 hours and cooled freely down to
room temperature.
2.2. Characterization
The surface morphology and composition of the
substrates and coatings were examined via scanning
electron microscopy (SEM, Hitachi S-4800, Japan)
equipped with energy-dispersive X-ray analysis
(EDX); SUTW-Sapphire detector; operated in high
vacuum, 10–5 Pa. The elemental and chemical
composition of coatings was investigated by using
XPS measurement (Kratos axis ultra DLD) with the
monochromatic radiation scanned AlKα X-ray
source (hν = 1486.6 eV) in a vacuum chamber,
~10-10 Pa.
The Ti-6Al-4V specimens after sequent H2O2-
oxidizing, RF-sputtering processes were pasted on
rectangle metal plates with a size of 10×50 mm2 and
a thickness of 0.5 mm. The adhesion strength of the
sintered specimens was tested according to the
standard adhesion test ASTM F1044-99, and the
experimental model was set-up following the
publication.[12] Testing was carried out using
Universal Testing Machine (Model 8848, Instron,
USA) with a 1000 N load cell and a cross-head
speed of 0.2 mm/min. The fracture areas were
observed by Olympus Microscope (BX51M,
IMTcam3 P/N: TP603100A). The adhesive strength
was calculated as the peak force/fracture area,
applying to two groups, and the average values were
used as a final result.
3. RESULTS AND DISCUSSION
Figure 1a shows a typical SEM micrograph image of
TiO2/Ti-6Al-4V. The TiO2 layer consists of a
significant amount of pores with diameters ranging
from 50 to 200 nm. On the nanostructured surface,
HAp was deposited using RF sputtering for 0.5 h.
Figure 1b shows an SEM micrograph of the as-
processed HAp-coated Ti-6Al-4V surface, where the
surface still maintains a porous structure. According
to Despina D Deligianni et al.,[15] the surface
roughness of HAp may improve the short- and the
longer-term response of bone marrow cells in vitro
because of the selective adsorption of serum
proteins. A previous publication[16] indicated that
biomaterials with surface roughness (1-10 µm)
benefit from increasing the biomaterial-tissue
interlocking and promoting osteoblast
differentiation. Other researchers have considered
the effect of surface topography of HAp coatings on
cell adhesion, proliferation as well as detachment
strength, and indicated the significant role of HAp
pore surface. However, as the above mention,
the adhesion of HAp coated on Ti–6Al–4V implant
was improved in case of a denser microstructure
HAp coating layer deposited on a Ti–6Al–4V pore
substrate to achieve favorable mechanical
interlocking to the HAp coating layer.[17] Therefore,
to respond to both of two demands (1) high bonding
strength between HAp and Ti-6Al-4V; and (2) a
HAp pore surface supporting the selective
adsorption of proteins, the sputtering time should be
appropriately controlled.
The EDX technique was used to determine the
elemental composition in the TiO2/Ti-6Al-4V,
HAp/TiO2/Ti-6Al-4V surfaces (figure 2 and table 1).
In this measurement, the angle between the sample
surface (at 0° tilt) and the detector axis is 35° to gain
the maximized count rate of the detector. The
resolution of EDX is measured at 130.62 eV to
separate overlapping peaks. Using a sapphire
detector, it can achieve the best decision and light
element performance in this case. EDX result of
TiO2/Ti-6Al-4V surface shows the presence of
Vietnam Journal of Chemistry Characteristics of hydroxyapatite coating on
© 2020 Vietnam Academy of Science and Technology, Hanoi & Wiley-VCH GmbH www.vjc.wiley-vch.de 656
elements including aluminum (Al), titanium (Ti),
vanadium (V), and oxygen (O), which are primary
components of the oxidized alloy (figure 2a). The
HAp/TiO2/Ti-6Al-4V surface contains the additional
elements of phosphor (P) and calcium (Ca) that
attributed to HAp, whose molecular structure is
Ca10(PO4)6(OH)2. The presence of oxygen resulted
from the oxidation of the substrate and the formation
of apatite.
(a) TiO2/Ti-6Al-4V (b) HAp/TiO2/Ti-6Al-4V (HAp sputtering time: 0.5 h)
Figure 1: SEM images of TiO2/Ti-6Al-4V and HAp/TiO2/Ti-6Al-4V surfaces before annealing
(a) TiO2/Ti-6Al-4V (b) HAp/TiO2/Ti-6Al-4V (HAp sputtering time: 0.5 h)
Figure 2: EDX spectra of the samples before annealing
Remarkably, EDX analysis investigates the
amount of V, and Al atoms significantly decreased
after covering the surface by HAp coating (table 1).
Releasing V ions potentially affects toxicity in
human lung cells.[18] Besides, releasing Al
ions associates with neurotoxicity and senile
dementia of the Alzheimer type.[19] Whereas pure
titanium is considered to be the best biocompatible
metallic material,[20] Ca2+ and HPO42- are ionic
compositions of blood plasma, interstitial fluid, and
intracellular fluid.[21]
Table 1: Elemental composition (at %) of TiO2/Ti-
6Al-4V and HAp/TiO2/Ti-6Al-4V samples
Element
Atom (%)
TiO2/Ti6Al4V
HAp/TiO2/Ti6Al4V
HAp sputtering time: 0.5 h
O 47.13 39.36
Al 01.77 00.83
Ti 50.58 27.41
V 00.52 -
P - 06.18
Ca - 26.22
Vietnam Journal of Chemistry Nguyen Thi Truc Linh, Phan Dinh Tuan
© 2020 Vietnam Academy of Science and Technology, Hanoi & Wiley-VCH GmbH www.vjc.wiley-vch.de 657
Logically, the HAp coating can play the role of
an effective barrier to prevent releasing V, Al ions
from the metallic implant due to the thickness of
HAp coating layer, which is directly affected by the
RF sputtering time. The XPS results of the denser
HAp coating layer on top of the Ti-6Al-4V substrate
via sequent H2O2-oxidizing and RF-sputtering
processes at a longer sputtering time (2 hours) were
shown in figure 3.
Figure 3 (a-c) presents XPS spectra of Ti 2p, Al
2p and V 2p of the dense HAp/H2O2-oxidized Ti-
6Al-4V surface, compared to H2O2-oxidized Ti-6Al-
4V substrate. The XPS data of the H2O2-oxidized Ti-
6Al-4V sample was discussed in our fundamental
research with main features: a spin-split doublet of
Ti 2p1/2 and Ti 2p3/2 at 463.4 eV and 457.8 eV are
accounted for the oxidation state of TiO2 (+4
oxidation state); a single peak at 73.2 eV
corresponds to Al2O3 (+3 oxidation state); a minor
peak at 515 eV is associated with V2O3 (+3
oxidation state). However, all metallic elements of
Ti-6Al-4V alloy cannot be detected by XPS analysis
after depositing HAp on the H2O2-oxidized Ti-6Al-
4V substrate for 2 hours.
Figure 3: Core level high resolution (HR) XPS spectra:
(a) Ti 2p, (b) O 1s, (c) Al 2p, (d) V 2p, (e) Ca 2p and (f) P 2p
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Vietnam Journal of Chemistry Characteristics of hydroxyapatite coating on
© 2020 Vietnam Academy of Science and Technology, Hanoi & Wiley-VCH GmbH www.vjc.wiley-vch.de 658
Figure 3d shows a higher O 1s peak located at
around 529 eV of the H2O2-oxidized Ti-6Al-4V
sample, which is mainly ascribed to the Ti-O bond
as well as other minor Al- or V-related oxides.[22] A
lower O 1s peak located at 530.06 eV of the HAp on
the H2O2-oxidized Ti-6Al-4V substrate, which is
attributed to the Ca-O bond. A peak at around 533
eV corresponding to the P-O bond was not detected
in the O1s spectrum. Still, a peak having low
intensity at 132.27eV in the P 2p spectrum (figure
3e) can be attributed to the pyrophosphate groups
(NIST XPS database). Figure 3f shows the Ca 2p
spectrum with a doublet band at 345.82 eV and
349.45 eV, which is typical for calcium oxide in
inorganic calcium-oxygen compounds. This
attribution was supported by the result of the O1s
spectrum with a peak at 530.06 eV, which is referred
above. As a result, the atom ratio of Ca to P in the
HAp coating layer synthesized by RF sputtering was
higher than that in Ca10(PO4)6(OH)2) pure phase, and
the crystallite creation of HAp phase was not
perfect.
In a study on the adhesion between HAp coating
layer and Ti-6Al-4V substrate, the RF sputtering time
is 2 hours, and the samples were annealed at 400 C
to achieve a denser microstructure and highly
crystalline HAp coating layer.[17] The surface
morphology and bonding strength of HAp coating
layer deposited on top of the H2O2-oxidized Ti-6Al-
4V substrate are compared with that of the original
Ti-6Al-4V one. SEM images of HAp/TiO2/Ti-6Al-4V
and HAp/Ti-6Al-4V samples are shown in Fig. 4.
(a) HAp/Ti-6Al-4V (b) HAp/TiO2/Ti-6Al-4V
Figure 4: SEM images of HAp/TiO2/Ti-6Al-4V, compared to HAp/Ti-6Al-4V samples
(HAp sputtering time: 2 h, after annealing)
Figure 4a shows a plate surface without a special
sign, while figure 4b exhibits a denser surface with
few visible nanoholes (20-30 nm diameter). The
H2O2-oxidizing state creates mechanical anchorages
which support to get a stable coating on Ti-6Al-4V
substrate. The surface features of the underlying
H2O2-oxidized Ti-6Al-4V substrate (the porous,
nanostructured surface morphology) are hidden by
the progress of the development of HAp grains due
to the thermal energy provided after annealing at
600 °C. Therefore, the RF sputtering process is
sequentially done after H2O2-oxidizing to form the
dense HAp coating layer on the rough Ti-6Al-4V
surface, which is waited for increasing mechanical
interlocking between the coating and substrate;
consequently, the bonding strength of the coating to
the substrate is improved.[17] Moreover, the result
also shows that the surface roughness of HAp can be
controlled by changing the depositing time;
therefore, choosing the appropriate sputtering time is
dependent on the purpose of use.
The shear strength values of the samples with
and without oxidizing in H2O2 were measured (table
2 and figure 5).
Figure 5 shows a remarkable difference between
the two groups: the peak force values of HAp/H2O2-
oxidized Ti-6Al-4V samples are in the range of 440-
547 N, while those of HAp/original Ti-6Al-4V ones
are in the lower range of 62-80 N with an
insignificant difference in fracture area values. As a
result, the shear strength of HAp coating layer out of
the Ti-6Al-4V substrate is around 12.9 MPa, which
is significantly smaller than that of H2O2-oxidized
Ti-6Al-4V substrate (approximately 69.3 MPa),
table 2. The shear strength of the HAp coating layer
without the TiO2 sub-layer is appropriate to the
value, which was reported in the publication,[12]
while that of the HAp coating layer with the TiO2
inner layer is four times higher. The results prove
the favorite role of H2O2-oxidizing state to the
adhesion between HAp coating layer and Ti-6Al-4V
substrate: a porous oxide interlayer may provide
Vietnam Journal of Chemistry Nguyen Thi Truc Linh, Phan Dinh Tuan
© 2020 Vietnam Academy of Science and Technology, Hanoi & Wiley-VCH GmbH www.vjc.wiley-vch.de 659
better anchorage, improve the mechanical
interlocking between the layer and substrate as well
as prevent the formation or propagation of cracks
during the annealing process.
Table 2: Adhesion strengths of HAp coated Ti-6Al-4V substrates with and without oxidizing in H2O2
Samples Peak force (N) Fracture area (mm2) Shear strength (MPa)
No1-HAp/TiO2/Ti-6Al-4V 547 8 68.4
No2-HAp/TiO2/Ti-6Al-4V 530 8 66.3
No3-HAp/TiO2/Ti-6Al-4V 440 6 73.3
No1-HAp/Ti-6Al-4V 78 6 13
No2-HAp/Ti-6Al-4V 80 6 13.3
No3-HAp/Ti-6Al-4V 62 5 12.4
Figure 5: Adhesion strengths of HAp/TiO2/Ti-6Al-4V, compared to HAp/Ti-6Al-4V samples
4. CONCLUSION
In this study, the biocompatibility coating was
formed on Ti-6Al-4V via sequent H2O2-oxidizing
and RF-sputtering processes.
The H2O2-oxidizing state plays a role in the
creation of mechanical anchorage, which improves
the adhesion between the coating and substrate. In
contrast, the RF sputtering state forms a stable and
biocompatibility HAp coating layer, which can play
the role of an effective barrier to prevent releasing
V, Al ions from the metallic implant. The
combination of physics and chemistry methods in
the modification of Ti-6Al-4V alloy for biomedical
applications is efficiently proved.
Acknowledgment. The research was supported by
Ho Chi Minh City University of Education, Vietnam
though the Project coded CS.2019.19.20.
Conflicts of Interest. The authors declare no
conflict of interest.
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3. S. Bahl, S. Das, S. Suwas, K. Chatterjee. Engineering
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